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Deposition of TiN/TiAlN multilayers by plasma-activated EB-PVD: tailored microstructure by jumping beam technology

Crossref DOI link: https://doi.org/10.1007/s12598-016-0824-2

Published Online: 2016-12-20

Published Print: 2017-08

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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