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Substrate angle‐induced fully <i>c</i> ‐axis orientation of AlN films deposited by off‐normal DC sputtering method

Crossref DOI link: https://doi.org/10.1007/s12598-020-01675-z

Published Online: 2021-02-26

Published Print: 2021-12

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Xie, Bo‐Wei

Ding, Fa‐Zhu https://orcid.org/0000-0002-6285-738X
Shang, Hong‐Jing

Huang, Da‐Xing

Li, Tai‐Guang

Zou, Qi

Zhang, Ji‐Liang

Gu, Hong‐Wei https://orcid.org/0000-0003-0882-8470
Funding

Funding for this research was provided by:

Natural Science Foundation of Hebei Province (E2018402097)

National Natural Science Foundation of China (51721005)

National Natural Science Foundation of China (U1832131)

Natural Science Foundation of Beijing Municipality (3202034)

Natural Science Foundation of Hebei Province (E2018402097)

National Natural Science Foundation of China (51721005)

National Natural Science Foundation of China (U1832131)

Natural Science Foundation of Beijing Municipality (3202034)
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Text and Data Mining valid from 2021-02-26

Text and Data Mining valid from 2021-02-26

Version of Record valid from 2021-02-26
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Article History

Received: 15 July 2020

Revised: 6 September 2020

Accepted: 9 September 2020

First Online: 26 February 2021