A facile and non-destructive quartz fiber shadow mask process for the sub-micrometer device fabrication on two-dimensional semiconductors
Crossref DOI link: https://doi.org/10.1007/s12598-021-01787-0
Published Online: 2021-07-17
Published Print: 2022-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Li, Li-An
Zhao, Fang-Yuan
Zhai, Shen-Qiang http://orcid.org/0000-0003-3186-4461
Liu, Feng-Qi
Wei, Zhong-Ming
Text and Data Mining valid from 2021-07-17
Version of Record valid from 2021-07-17
Article History
Received: 1 February 2021
Revised: 1 April 2021
Accepted: 9 April 2021
First Online: 17 July 2021