High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
Crossref DOI link: https://doi.org/10.1007/s12633-015-9322-7
Published Online: 2015-08-19
Published Print: 2016-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Mahajan, A. M.
Khairnar, Anil G.
Thibeault, B. J.
Text and Data Mining valid from 2015-08-19