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Dopant Segregation and Heat Treatment Effects on the Electrical Properties of Polycrystalline Silicon thin Films

Crossref DOI link: https://doi.org/10.1007/s12633-015-9359-7

Published Online: 2015-12-19

Published Print: 2016-10

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Zaidi, B.

Hadjoudja, B.

Shekhar, C.

Chouial, B.

Li, R.

Madhava Rao, M. V.

Gagui, S.

Chibani, A.
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