High Temperature Crystallization Process of a-Si Thin-films on Aluminum Nitride Substrates
Crossref DOI link: https://doi.org/10.1007/s12633-015-9369-5
Published Online: 2016-01-24
Published Print: 2018-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Bhopal, Muhammad Fahad
Lee, Doowon
Rehman, Atteq ur
Lee, Soo Hong
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