Study of Infra-red Spectroscopy on Bonding Environment and Structural Properties of Nanocrystalline Silicon Thin Films Grown by VHF-PECVD Process
Crossref DOI link: https://doi.org/10.1007/s12633-018-0008-9
Published Online: 2018-11-16
Published Print: 2019-08
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Juneja, Sucheta
Sharma, Mansi
Kumar, Sushil
Text and Data Mining valid from 2018-11-16
Article History
Received: 16 May 2018
Accepted: 2 November 2018
First Online: 16 November 2018