Modeling and Analysis of a Front High-k gate stack Dual-Material Tri-gate Schottky Barrier Silicon-on-Insulator MOSFET with a Dual-Material Bottom Gate
Crossref DOI link: https://doi.org/10.1007/s12633-018-9940-y
Published Online: 2018-07-24
Published Print: 2019-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Banerjee, Pritha
Sarkar, Subir Kumar
Funding for this research was provided by:
University Grants Commission
Text and Data Mining valid from 2018-07-24
Article History
Received: 5 January 2018
Accepted: 26 June 2018
First Online: 24 July 2018