A Comparative Study on Scaling Capabilities of Si and SiGe Nanoscale Double Gate Tunneling FETs
Crossref DOI link: https://doi.org/10.1007/s12633-019-00190-w
Published Online: 2019-06-04
Published Print: 2020-04
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Bentrcia, Toufik https://orcid.org/0000-0001-8069-314X
Djeffal, Fayçal
Ferhati, Hichem
Dibi, Zohir
Text and Data Mining valid from 2019-06-04
Version of Record valid from 2019-06-04
Article History
Received: 19 February 2019
Accepted: 21 May 2019
First Online: 4 June 2019