Influence of Source Stack and Heterogeneous Gate Dielectric on Band to Band Tunneling Rate of Tunnel FET
Crossref DOI link: https://doi.org/10.1007/s12633-019-00272-9
Published Online: 2019-11-01
Published Print: 2020-08
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Karbalaei, Mohammad http://orcid.org/0000-0002-0806-6958
Dideban, Daryoosh
Text and Data Mining valid from 2019-11-01
Version of Record valid from 2019-11-01
Article History
Received: 12 June 2019
Accepted: 9 September 2019
First Online: 1 November 2019