A 2-D Analytical Modeling of Dual Work Function Metal Gate MOSFET Using High-K Gate Dielectric with Enhanced RF/Analog Performance for Low Power Applications
Crossref DOI link: https://doi.org/10.1007/s12633-019-00290-7
Published Online: 2019-12-01
Published Print: 2020-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kiran Kumar, R. http://orcid.org/0000-0003-0671-9641
Shiyamala, S.
Text and Data Mining valid from 2019-12-01
Version of Record valid from 2019-12-01
Article History
Received: 28 August 2019
Accepted: 29 September 2019
First Online: 1 December 2019