Effect of High-Temperature Annealing on Epitaxially Grown Ru Silicide Thin Films
Crossref DOI link: https://doi.org/10.1007/s12633-019-00336-w
Published Online: 2019-12-06
Published Print: 2020-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Fouda, A. N. http://orcid.org/0000-0001-5404-1631
Eid, E. A.
Text and Data Mining valid from 2019-12-06
Version of Record valid from 2019-12-06
Article History
Received: 2 August 2019
Accepted: 25 November 2019
First Online: 6 December 2019