Selection of Low Dimensional Material Alternatives to Silicon for Next Generation Tunnel Field Effect Transistors
Crossref DOI link: https://doi.org/10.1007/s12633-020-00452-y
Published Online: 2020-04-19
Published Print: 2021-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Manocha, Pratyush
Kandpal, Kavindra
Goswami, Rupam http://orcid.org/0000-0001-8491-2282
Text and Data Mining valid from 2020-04-19
Version of Record valid from 2020-04-19
Article History
Received: 13 January 2020
Accepted: 11 March 2020
First Online: 19 April 2020