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Analytical Drain Current Model for Source Pocket Engineered Stacked Oxide SiO2/HfO2 Cylindrical Gate TFETs

Published Online: 2020-06-30

Published Print: 2021-06

Authors

Singh, Prince Kumar

Baral, Kamalaksha

Kumar, Sanjay

Tripathy, Manas Ranjan

Singh, Ashish Kumar

Upadhyay, Rishibrind Kumar

Chander, Sweta

Jit, Satyabrata https://orcid.org/0000-0001-6772-8117
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Text and Data Mining valid from 2020-06-30

Version of Record valid from 2020-06-30
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Article History

Received: 14 February 2020

Accepted: 12 June 2020

First Online: 30 June 2020

Document is current