Modeling, Simulation and Analysis of Surface Potential and Threshold Voltage: Application to High-K Material HfO2 Based FinFET
Crossref DOI link: https://doi.org/10.1007/s12633-020-00607-x
Published Online: 2020-10-20
Published Print: 2021-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Panchanan, Suparna
Maity, Reshmi
Baishya, S.
Maity, N. P. http://orcid.org/0000-0002-1256-5856
Text and Data Mining valid from 2020-10-20
Version of Record valid from 2020-10-20
Article History
Received: 24 March 2020
Accepted: 14 July 2020
First Online: 20 October 2020