Design and Analysis of Triple Metal Vertical TFET Gate Stacked with N-Type SiGe Delta-Doped Layer
Crossref DOI link: https://doi.org/10.1007/s12633-021-01211-3
Published Online: 2021-06-21
Published Print: 2022-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Gupta, Shilpi http://orcid.org/0000-0002-5860-8188
Wairya, Subodh
Singh, Shailendra
Text and Data Mining valid from 2021-06-21
Version of Record valid from 2021-06-21
Article History
Received: 17 April 2021
Accepted: 15 June 2021
First Online: 21 June 2021
Declarations
:
: Not Applicable.
: No conflicts to report.
: Not applicable.