Crossmark

Performance Evaluation of Junctionless FinFET using Spacer Engineering at 15 nm Gate Length

Published Online: 2022-03-30

Published Print: 2022-11

Authors

Kaur, Navneet https://orcid.org/0000-0003-0515-2698
Gill, Sandeep Singh

Kaur, Prabhjot
License Information

Text and Data Mining valid from 2022-03-30

Version of Record valid from 2022-03-30
More Information

Article History

Received: 28 September 2021

Accepted: 14 March 2022

First Online: 30 March 2022

Declarations

:

: All the authors give consent to submit paper in this journal.

: The authors have agreed for submitting this manuscript in Silicon Journal and agree to publish, if accepted. It has not been sent elsewhere for consideration.

: Authors does not have any conflicts of interest.

: This work complies with the ethical standards.

Document is current