The Effect of a Dual Oxide - Dual Gate Material and a Sensitivity Analysis on the Performance of a Junctionless Tunnel FET
Crossref DOI link: https://doi.org/10.1007/s12633-024-02964-3
Published Online: 2024-04-06
Published Print: 2024-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Koppolu, Kalpana
B, Samuyelu
K, C B Rao
Text and Data Mining valid from 2024-04-06
Version of Record valid from 2024-04-06
Article History
Received: 18 December 2023
Accepted: 22 March 2024
First Online: 6 April 2024
Declarations
:
: The authors declare no competing interests.
: Yes