Preparation of SiO2 Film with High Hardness and Antireflection with AEO
Crossref DOI link: https://doi.org/10.1007/s12633-025-03225-7
Published Online: 2025-01-29
Published Print: 2025-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Li, Zhaorui
Li, Zhiqiang
Wu, Yonghong
Zhu, Wenle
Nie, Lifang
Liu, Juncheng
Text and Data Mining valid from 2025-01-29
Version of Record valid from 2025-01-29
Article History
Received: 5 October 2024
Accepted: 16 January 2025
First Online: 29 January 2025
Declarations
:
: The authors declare no competing interests.