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A Generalized Precise Approach for KOH Etching in Monocrystalline Silicon Wafer with an Orientation of < 100 > using Machine Learning

Crossref DOI link: https://doi.org/10.1007/s12633-025-03350-3

Published Online: 2025-05-30

Published Print: 2025-07

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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