Analytical threshold voltage modeling of ion-implanted strained-Si double-material double-gate (DMDG) MOSFETs
Crossref DOI link: https://doi.org/10.1007/s12648-016-0918-6
Published Online: 2016-09-09
Published Print: 2017-04
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Goel, Ekta
Singh, Balraj
Kumar, Sanjay
Singh, Kunal
Jit, Satyabrata http://orcid.org/0000-0001-6772-8117
License valid from 2016-09-09