Dual-material gate dual-stacked gate dielectrics gate-source overlap tri-gate germanium FinFET: analysis and application
Crossref DOI link: https://doi.org/10.1007/s12648-018-1289-y
Published Online: 2018-09-03
Published Print: 2019-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Das, Rajashree
Baishya, Srimanta
Text and Data Mining valid from 2018-09-03
Article History
Received: 3 December 2017
Accepted: 22 May 2018
First Online: 3 September 2018