The high-resolution nanostructuring of Si wafer surface with 10 nm scale using a combined ion bombarding technique and chemical reaction
Crossref DOI link: https://doi.org/10.1007/s13233-016-4136-z
Published Online: 2016-10-17
Published Print: 2016-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Jeon, Hwan-Jin
Jeong, Hyeon Su
License valid from 2016-10-17