Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information
Crossref DOI link: https://doi.org/10.1007/s13361-015-1159-1
Published Online: 2015-05-08
Published Print: 2015-08-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Wang, Zhaoying
Liu, Bingwen
Zhao, Evan W.
Jin, Ke
Du, Yingge
Neeway, James J.
Ryan, Joseph V.
Hu, Dehong
Zhang, Kelvin H. L.
Hong, Mina
Le Guernic, Solenne
Thevuthasan, Suntharampilai
Wang, Fuyi
Zhu, Zihua
Text and Data Mining valid from 2015-05-08