Physical Characteristics of Low-Dose Nitrogen Ions-Implanted Copper Oxide Thin Film on n-Si (100) Substrate
Crossref DOI link: https://doi.org/10.1007/s13369-024-09107-1
Published Online: 2024-05-15
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Ayub, Muhammad Arslan
Afzal, Naveed http://orcid.org/0009-0006-9098-6425
Rafique, Mohsin
Aslam, Sameen
Text and Data Mining valid from 2024-05-15
Version of Record valid from 2024-05-15
Article History
Received: 22 January 2024
Accepted: 22 April 2024
First Online: 15 May 2024