Crystal orientation variation of nonpolar AlN films with III/V ratio on r-plane sapphire substrates by plasma-assisted molecular beam epitaxy
Crossref DOI link: https://doi.org/10.1007/s13391-014-4114-6
Published Online: 2014-11-10
Published Print: 2014-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Le, Duc Duy
Kim, Dong Yeob
Hong, Soon-Ku
Text and Data Mining valid from 2014-11-01