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Bi-layer channel structure-based oxide thin-film transistors consisting of ZnO and Al-doped ZnO with different Al compositions and stacking sequences

Crossref DOI link: https://doi.org/10.1007/s13391-014-4305-1

Published Online: 2015-03-10

Published Print: 2015-03

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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