Improved work function of preferentially oriented indium oxide films induced by the plasma exposure technique
Crossref DOI link: https://doi.org/10.1007/s13391-015-4342-4
Published Online: 2015-10-28
Published Print: 2015-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Yang, Lei
Guo, Shuai
Yang, Qiuling
Zhu, Yuankun
Dai, Bing
Yu, Hailing
Lei, Pei
Han, Jiecai
Hou, Ying
Zhu, Jiaqi
Text and Data Mining valid from 2015-10-28