A novel, organic, UV-sensitive resist ideal for nanoimprint-, photo- and laser lithography in an air atmosphere
Crossref DOI link: https://doi.org/10.1007/s13391-015-4401-x
Published Online: 2015-06-30
Published Print: 2015-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Greer, Andrew I. M.
Gadegaard, Nikolaj
Text and Data Mining valid from 2015-06-30