Studies on RF magnetron sputtered HfO2 thin films for microelectronic applications
Crossref DOI link: https://doi.org/10.1007/s13391-015-4490-6
Published Online: 2015-07-10
Published Print: 2015-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kondaiah, P.
Shaik, Habibuddin
Mohan Rao, G.
Text and Data Mining valid from 2015-07-01
