A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
Crossref DOI link: https://doi.org/10.1007/s13391-017-6111-z
Published Online: 2016-12-09
Published Print: 2017-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Altuntas, Halit
Bayrak, Turkan
License valid from 2016-12-09