Effect of O2 plasma treatment on density-of-states in a-IGZO thin film transistors
Crossref DOI link: https://doi.org/10.1007/s13391-017-6214-6
Published Online: 2016-11-28
Published Print: 2017-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Ding, Xingwei
Huang, Fei
Li, Sheng
Zhang, Jianhua
Jiang, Xueyin
Zhang, Zhilin
License valid from 2016-11-28