Sulfur Incorporation at Interface Between Atomic-Layer-Deposited Al2O3 Thin Film and AlGaN/GaN Heterostructure
Crossref DOI link: https://doi.org/10.1007/s13391-018-00110-x
Published Online: 2018-12-07
Published Print: 2019-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Jo, Yoo Jin
Jin, Hyun Soo
Ha, Min-Woo
Park, Tae Joo
Funding for this research was provided by:
NRF (2017R1C1B5016033)
KSRC (10067739)
Text and Data Mining valid from 2018-12-07
Article History
Received: 9 October 2018
Accepted: 28 November 2018
First Online: 7 December 2018