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Effects of Sputtering Power, Working Pressure, and Electric Bias on the Deposition Behavior of Ag Films during DC Magnetron Sputtering Considering the Generation of Charged Flux

Crossref DOI link: https://doi.org/10.1007/s13391-021-00314-8

Published Online: 2021-10-19

Published Print: 2022-01

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Jang, Gil Su

Ahn, Seon Mi

Hwang, Nong-Moon https://orcid.org/0000-0003-1377-8658
Funding

Funding for this research was provided by:

global frontier hybrid interface materials (NRF-2013M3A6B1078874)

national research foundation of korea (2020R1A5A6017701)

samsung (0417-20200170)
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Text and Data Mining valid from 2021-10-19

Version of Record valid from 2021-10-19
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Article History

Received: 23 July 2021

Accepted: 1 September 2021

First Online: 19 October 2021

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