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Effects of Substrate Bias and Ar Pressure on Growth of α-phase in W Thin Films Deposited by RF Magnetron Sputtering

Published Online: 2022-12-29

Published Print: 2023-05

Authors

Ahn, Seon Mi

Jang, Gil Su

Kim, Du Yun

Hwang, Nong-Moon https://orcid.org/0000-0003-1377-8658
Funding

Funding for this research was provided by:

Ministry of Science and ICT, South Korea (2020R1A5A6017701)

Samsung
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Text and Data Mining valid from 2022-12-29

Version of Record valid from 2022-12-29
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Article History

Received: 20 November 2022

Accepted: 6 December 2022

First Online: 29 December 2022

Declarations

:

: The authors declare that they have no conflict of interest.

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