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Enhanced Thickness Uniformity of MoS2 Thin Films on SiO2/Si Substrates via Substrate Pre-Treatment with Oxygen Plasma

Published Online: 2024-02-05

Published Print: 2024-09

Authors

Lim, Irang

Koo, Youjin

Choi, Woong https://orcid.org/0000-0001-6922-6655
Funding

Funding for this research was provided by:

National Research Foundation of Korea (2022M3H4A6A01036614)
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Text and Data Mining valid from 2024-02-05

Version of Record valid from 2024-02-05
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Article History

Received: 30 November 2023

Accepted: 21 January 2024

First Online: 5 February 2024

Declarations

:

: The authors have no conflicts to disclose.

: Not applicable.

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