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Electrical Performance and Stability Improvement of In2O3 Thin-Film Transistors Engendered by Oxygen-Free Focused Plasma Treatment

Crossref DOI link: https://doi.org/10.1007/s13391-024-00531-x

Published Online: 2024-11-22

Published Print: 2025-03

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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