Effect of Hydrogen on the Properties of RF-Magnetron Sputtering ZnO:Al Films as an Alternative to Commercially Available TCO Films
Crossref DOI link: https://doi.org/10.1007/s40033-016-0123-y
Published Online: 2016-09-01
Published Print: 2017-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Das, Rajesh
Sekhar Das, Himadri
Funding for this research was provided by:
Science and Engineering Research Board (DST/TM/SERI/2K10/67(G))
License valid from 2016-09-01