Chemical mechanical planarization mechanism of epitaxially grown Ge-film for sequential integrating 3D-structured transistor cells
Crossref DOI link: https://doi.org/10.1007/s40042-022-00662-0
Published Online: 2022-11-14
Published Print: 2022-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Bae, Jae-Young
Han, Man-Hyup
Shim, Tae-Hun
Park, Jea-Gun https://orcid.org/0000-0002-5831-2854
Text and Data Mining valid from 2022-11-14
Version of Record valid from 2022-11-14
Article History
Received: 24 October 2022
Revised: 3 November 2022
Accepted: 3 November 2022
First Online: 14 November 2022
Declarations
:
: The authors declare that they have no conflict of interest.