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Plasma atomic layer etching of SiO2 and Si3N4 using low global warming hexafluoropropene

Published Online: 2025-01-29

Published Print: 2025-03

Authors

Choi, Minsuk

Lee, Hyeongwu

Jung, Taeseok

Jeon, Minsung

Chae, Heeyeop
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Text and Data Mining valid from 2025-01-29

Version of Record valid from 2025-01-29
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Article History

Received: 28 November 2024

Revised: 28 November 2024

Accepted: 9 December 2024

First Online: 29 January 2025

Declarations

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: The authors have no competing interests to declare that are relevant to the content of this article.

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