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Impact of interface states and series resistance on the electrical and dielectric response of ECR-PECVD SiO₂/p-Si MOS structures

Published Online: 2026-04-03

Published Print: 2026-07

Authors

Rejeiba, Omar

Braña de cal, Alejandro F.

Matoussi, Adel
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Text and Data Mining valid from 2026-04-03

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Article History

Received: 31 December 2025

Revised: 24 February 2026

Accepted: 24 March 2026

First Online: 3 April 2026

Declarations

:

: The authors declare no competing interests.

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