Effect of plasma oxidation parameters on physical properties of nanocrystalline nickel oxide thin films grown by two-step method: DC sputtering and plasma oxidation
Crossref DOI link: https://doi.org/10.1007/s40094-019-00350-8
Published Online: 2019-09-19
Published Print: 2019-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Hajakbari, F.
Rashvand, S.
Hojabri, A.
Text and Data Mining valid from 2019-09-19
Version of Record valid from 2019-09-19
Article History
Received: 30 May 2019
Accepted: 10 September 2019
First Online: 19 September 2019