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Chemically Amplified Resist Based on Dendritic Molecular Glass for Electron Beam Lithography

Published Online: 2022-07-14

Published Print: 2023-02

Authors

Hu, Shengwen

Chen, Jinping

Yu, Tianjun

Zeng, Yi

Yang, Guoqiang

Li, Yi
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Text and Data Mining valid from 2022-07-14

Version of Record valid from 2022-07-14
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Article History

Received: 5 May 2022

Accepted: 20 June 2022

First Online: 14 July 2022

Conflicts of Interest

: The authors declare no conflicts of interest.

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