A DoE–TOPSIS meta-model for parametric optimization of silicon carbonitride (SiCN) thin film deposition process
Crossref DOI link: https://doi.org/10.1007/s40430-019-1796-6
Published Online: 2019-06-21
Published Print: 2019-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kumar, Dhruva
Das, Partha Protim
Chakraborty, Shankar
Sharma, Ashis
Swain, Bibhu P.
Text and Data Mining valid from 2019-06-21
Version of Record valid from 2019-06-21
Article History
Received: 9 October 2018
Accepted: 8 June 2019
First Online: 21 June 2019