Effect of Relative Surface Charge of Colloidal Silica and Sapphire on Removal Rate in Chemical Mechanical Polishing
Crossref DOI link: https://doi.org/10.1007/s40684-019-00020-9
Published Online: 2019-02-07
Published Print: 2019-04
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Park, Chuljin
Kim, Hyoungjae
Cho, Hanchul
Lee, Taekyung
Kim, Doyeon
Lee, Sangjik
Jeong, Haedo
Text and Data Mining valid from 2019-02-07
Article History
Received: 25 June 2017
Revised: 14 November 2017
Accepted: 15 February 2018
First Online: 7 February 2019