Composition control of pulsed laser deposited copper (I) chalcogenide thin films via plasma/Ar interactions
Crossref DOI link: https://doi.org/10.1007/s40843-015-0039-0
Published Online: 2015-03-28
Published Print: 2015-04
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Chen, Jikun
Lv, Yanhong
Döbeli, Max
Li, Yulong
Shi, Xun
Chen, Lidong
Text and Data Mining valid from 2015-03-28