A thiol-amine mixture for metal oxide towards device quality metal chalcogenides
Crossref DOI link: https://doi.org/10.1007/s40843-018-9376-7
Published Online: 2018-11-30
Published Print: 2019-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Zhang, Tong
Zhang, Lijian
Yin, Yiwei
Jiang, Chenhui
Li, Shi’ang
Zhu, Changfei
Chen, Tao
Text and Data Mining valid from 2018-11-30
Article History
Received: 12 October 2018
Accepted: 20 November 2018
First Online: 30 November 2018