Solution-processed amorphous gallium-tin oxide thin film for low-voltage, high-performance transistors
Crossref DOI link: https://doi.org/10.1007/s40843-018-9380-8
Published Online: 2018-12-26
Published Print: 2019-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Ren, Jinhua
Li, Kaiwen
Yang, Jianwen
Lin, Dong
Kang, Haoqing
Shao, Jingjing
Fu, Ruofan
Zhang, Qun
Text and Data Mining valid from 2018-12-26
Article History
Received: 28 July 2018
Accepted: 5 December 2018
First Online: 26 December 2018