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High-quality crystalline NiO/β-Ga2O3 p–n heterojunctions grown by the low-cost and vacuum-free mist-CVD for device applications

Crossref DOI link: https://doi.org/10.1007/s40843-023-2801-2

Published Online: 2024-04-25

Published Print: 2024-05

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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