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Enhancing the high-temperature stability of OFETs by inducing D-A stacking in P(NDI2OD-T2) films

Published Online: 2024-11-07

Published Print: 2025-01

Authors

Xiao, Xuetao

Li, Wenhao

Zhou, Qing

Wu, Zeng

Zuo, Xiaochan

Ma, Rong

Xu, Yifei

Wang, Sichun

Zhao, Yan
License Information

Text and Data Mining valid from 2024-11-07

Version of Record valid from 2024-11-07
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Article History

Received: 9 August 2024

Accepted: 7 October 2024

First Online: 7 November 2024

Ethics

: Conflict of interest The authors declare no conflict of interest.

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